6. Materials and Processes for Silicon Technology

6.1 Silicon

6.1.1 Producing Semiconductor-Grade Silicon

6.1.2 Silicon Crystal Growth and Wafer Production

6.1.3 Uses of Silicon Outside of Microelectronics

6.1.4 Summary to: 6.1 Materials and Processes for Silicon Technology

6.2 Si Oxides and LOCOS Process

6.2.1 Si Oxide

6.2.2 LOCOS Process

6.2.3 Summary to: 6.2 Si Oxide and LOCOS Process

6.3 Chemical Vapor Deposition

6.3.1 Silicon Epitaxy

6.3.2 Oxide CVD

6.3.3 CVD for Poly-Silicon, Silicon Nitride and Miscellaneous Materials

6.3.4 Summary to: 6.3 Chemical Vapor Deposition

6.4. Physical Processes for Layer Deposition

6.4.1 Sputter Deposition and Contact Hole Filling

6.4.2 Ion Implantation

6.4.3 Miscellaneous Techniques and Comparison

6.3.4 Summary to: 6.4 Physical Processes for Layer Deposition

6.5 Etching Techniques

6.5.1 General Remarks

6.5.2 Chemical Etching

6.5.3 Plasma Etching

6.5.3 Summary to: Etching Techniques

6.6 Lithography

6.6.1 Basic Lithography Techniques

6.6.2 Resist and Steppers

© H. Föll (Electronic Materials - Script)