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Essentially we have two rather direct methods |
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3 | æ ç è |
Dl l |
– |
Da a |
ö ÷ ø | = |
cV – ci |
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Differential Thermal Expansion (or Dl/ l- Da/a -method). | |
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.Positron annihilation | |
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Both methods will not give results if the vacancy concentration at the melting
point is below, roughly, 10–7. | |
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<t> | = |
t2 · |
1 + t2n · cV 1 + t1n · cV |
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Most numbers for point defects in metals and some other crystals were obtained
by these two methods. | |
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There are many other methods, but always either limited to certain crystals, expensive,
hard to evaluate, and so on. | |
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In essence, there are still no reliable and undisputed numbers for, e.g., the
formation and migration enthalpies for vacancies (and interstitials) in Si or other semiconductors like GaAs. |
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© H. Föll (Defects - Script)