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Epitaxial layers play a very big role in compound semiconductor technology, while
in Si it was only used for the bipolar technology. MOS and CMOS technologies for many generations could
do with the (for Si expensive) epitaxial layer deposition techniques. In compound technology it is different for
several reasons: |
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The substrates are far less perfect than Si single crystals, and epitaxial
layers usually have a better crystal quality than the substrates (this was also a main driving force behind Si epitaxy
in the early days of Si technologiy in the seventies). |
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There are more (and sometimes relatively cheap) methods to grow epitaxial layers of compound
semiconductors. |
© H. Föll (Semiconductors - Script)
