Intended Topics | ||
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4.1 Silicon on Insulator | |
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General advantages and problems, basic device structure | |
![]() | Modern developments Oxygen Implantation; waferbonding, smart cut technology | |
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4.2 Etching of Silicon | |
![]() | Chemical etches Isotropic and anisotropic dissolution, defect etches and anodic etching | |
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Micromechanics and microsystem technology Basic considerations, special process steps |
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Electrochemical etching, Porous Silicon and applications Photonic crystals, filters, sensors, microtechnology, integrated wave guides, ... | |
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4.3 Specialities | |
![]() | Amorphes Si and applications Structural and electronic properties, H - passivation, solar cells and FPDs | |
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SiGe: Materials ascpects and devices HEMT, detectors (incl. Ge), | |
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© H. Föll (Semiconductors - Script)