Most old pictures have not survived. Here is what I still have.
Fig. 7 in publication 67 Microstructure of n-type Si after prolonged etching with I <
IPSL
Pictures not in publications but relating to Fig. 3 in publication 60
Fig 9 in publication 67 and relating to Fig 9 in 60 Fig. 9. SEM micrograph (cross section, 0o)
of electrochemically etched trenches with high aspect ratio. (B2 sample, 10V, 30 min,330 pA/trench; all three samples: photocurrent
adjusted by back sideillumination, PSL removed by 10s in 10 w/o KOH.)
The picture rom the full paper (ref, 60) follows
Pictures not in publications but obviously related.