|  | The first law of materials science obtains: At field strengths larger than some 
critical value, dielectrics will experience (destructive) electrical breakdown |  |  | 
 |  |  | This might happen suddenly (then calls break-down) , with a bang and smoke, or |  | 
 |  |  | it may take time - months or years - then called failure. |  | 
 |  |  | Critical field strength may vary from < 100 kV/cm to > 10 MV / cm. |  |  | 
 
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|  | Highest field strengths in practical applications do not necessarily occur at 
high voltages, but e.g. in integrated circuits for very thin (a few nm) dielectric layers |  | 
  
| Example 1: TV set, 20 kV cable, thickness of insulation = 2 mm. Þ 
E = 100 kV/cm Example 2: Gate dielectric in transistor, 3.3 nm thick, 3.3 V operating voltage. Þ 
E = 10 MV/cm
 |  | 
 |  |  | Properties of thin films may be quite different (better!) than bulk properties! |  | 
 |  |  |  |  |  | 
 
|  | Electrical breakdown is a major source for failure of electronic products (i.e. 
one of the reasons why things go "kaputt" (= broke)), but there is no simple mechanism following some straight-forward 
theory. We have: |  |  | 
 |  |  | Thermal breakdown; due to small (field dependent) currents 
flowing through "weak" parts of the dielectric. |  |  | 
 |  |  | Avalanche breakdown due to occasional free electrons being accelerated in the field; 
eventually gaining enough energy to ionize atoms, producing more free electrons in a runaway avalanche. |  |  | 
 
|  |  | Local discharge producing micro-plasmas in small cavities, 
leading to slow erosion of the material. |  |  | 
 |  |  | Electrolytic breakdown due to some ionic micro conduction 
leading to structural changes by, e.g., metal deposition. |  |  | 
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© H. Föll (Electronic Materials - Script)